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钛蚀刻剂TFT
钛蚀刻剂TFT图片
品牌:Transene
包装:1加仑
产地:美国


产品名称
钛蚀刻剂TFT/TFTN
产品介绍
       钛蚀刻剂是应用于半导体制作和薄膜微电子技术的选择性控制蚀刻剂。
       钛蚀刻剂TFT设计用来蚀刻通常在微电子产品中作为连结层和阻挡层的蒸发法薄膜的蚀刻剂。这种蚀刻剂光刻胶匹配性良好、分辨率高、边下蚀现象低。
       Titanium Etchant TFT designed for etching evaporated films commonly employed as bonding and barrier layers in microelectronics. Excellent resolution, photo resist compatibility, and minimal undercutting are readily achieved.
       钛蚀刻剂TFTN用来蚀刻玻璃或SiO2基板上的Ti沉积膜。TFTN并不含氢氟酸。
       Titanium Etchant TFTN,Intended for etching Ti films deposited on glass or SiO2 substrates. TFTN does not contain hydrofluoric acid.
 
性质TFTTFTN
外观澄清水溶液澄清水溶液
PH11
闪点不可燃不可燃
贮存室温室温
有效期1年1年
毒性强酸强酸
蚀刻容器聚乙烯/聚丙烯聚乙烯/聚丙烯
温度20~50℃70~85℃
蚀刻速率25 Å/秒,20℃10 Å/秒,70℃
50 Å/秒,30℃50 Å/秒,80℃
冲洗
*匹配光刻胶正性和负性正性和负性
金属——除Al以外的大多数金属

*KPR/KMER/KTFR:PKP(Transene);AZ/RISTON/ETC.

PROPERTIES OF TRANSENE TITANIUM ETCHANT TFT

How do I increase the etch rate?1. The rate will approximately double with every 10°C increase in temperature.
2. Increase the rate of stirring or agitation.
How do I reduce the etch rate?Adding 1 part deionized water to 2 parts etchant will reduce the etch rate approximately 50%.
Do I need to dilute the etchant?No, it is ready to use.
How do I reduce undercutting?Increase the rate of stirring or agitation.
AppearanceClear, colorless
pHStrongly acidic
Etch Rate at 20°C25 Å/sec.
Etch Capacity (rate declines at ~70%)65 g/gallon
Shelf Life1 year
Storage ConditionsAmbient
Filtration0.2 um
Recommended Operating Temperatures20-80oC (30-40oC most common)
RinseDeionized water
Photoresist RecommendationsKLT6000 Series, KLT 5300 Series, HARE SQ (SU-8 type), TRANSIST, or PKP-308PI
Select Compatible MaterialsAu, Cu, Ni, Cr
Select Incompatible MaterialsGlass, oxide, nitride, GaAs
Compatible PlasticsHDPE, PP, Teflon, PFA, PVC
Country of OriginUSA
PackagingHDPE
IsotropyIsotropic
Incompatible ChemicalsStrong bases
Additional InformationContains HF!


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川思公司Transene Co INC
电话: 点击&查看
联系人: 销售部
地址: 广东省广州市天河区软件园1号楼2-806
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